<![CDATA[苏州赛森电子U技有限公司Suzhou Cycas Electronic Technology Co]]>zh_CN2020-06-16 14:51:592020-06-16 14:51:59YBlog RSS Generator5<![CDATA[KDF943i]]><![CDATA[ECLIPSE1]]><![CDATA[Des-212 drum type degumming machine]]><![CDATA[P5000CVD]]><![CDATA[NovellusC1ND-109]]><![CDATA[NovellusC1ND-103]]><![CDATA[Aviza/Spts]]><![CDATA[MRC PVD(自己仓库QMRC PVD (own warehouse)]]><![CDATA[MRC PVD(合肥QMRC PVD (own warehouse)]]><![CDATA[MRC PVDQ贵州）MRC PVD(own warehouse)]]><![CDATA[Axcelis 8250 medium current implanter]]><![CDATA[Nissin Exceed 3000AH medium current implanter]]><![CDATA[EVG6200 mask aligner]]><![CDATA[Suss Gemma Developer Cluster System]]><![CDATA[Nexus350i]]><![CDATA[Gasonics PEP3510 resist asher]]><![CDATA[EVG Gemini Automated production Wafer Bond]]><![CDATA[FEI865 dual beam]]><![CDATA[VeecoRF350]]><![CDATA[TEL Alpha8S diffusion furnace]]><![CDATA[Suss FC150 Flip Chip bonder]]><![CDATA[Suss ACS300+ coater/developer]]><![CDATA[Gasonics PEP3510 resist asher]]><![CDATA[CHA Mark40 Evaporator]]><![CDATA[Gasonics L3510]]><![CDATA[Lam TCP 9600]]><![CDATA[P5000]]><![CDATA[P5000]]><![CDATA[{离子体表面处理的技术及应用Technology and application of plasma surface treatment]]><![CDATA[{离子体表面处理的原理Principle of plasma surface treatment]]><![CDATA[A complete set of equipment for surface modification, surface activation, etching and nano coating of plasma cleaning machine{离子体清洗面改性、表面活化、刻蚀、纳cx层一台设备全搞定 A complete set of equipment for surface modification, surface activation, etching and nano coating]]><![CDATA[怎么选等d清洗备厂商呢QHow to choose plasma cleaning equipment manufacturers?]]><![CDATA[{离子清z机效果如何评估 How to evaluate the effect of plasma cleaning machine?]]><![CDATA[ A complete set of equipment for surface modification, surface activation, etching and nano coating of plasma cleaning machine{离子体清洗面改性、表面活化、刻蚀、纳cx层一台设备全搞定]]><![CDATA[{离子清z机在手业中的应用Application of plasma cleaning machine in mobile phone industry]]><![CDATA[{离子表面处理技术在塑料行业的应用Application of plasma surface treatment technology in plastics industry]]><![CDATA[控溅射的工作原理Working principle of magnetron sputtering]]><![CDATA[Magnetron sputtering has two characteristics of "low temperature" and "high speed"控溅射h“低温”、“高速”两大特点Magnetron sputtering has two characteristics of]]><![CDATA[What are balanced magnetron sputtering and unbalanced magnetron sputtering?什么是q控溅射和非q控溅射Q]]><![CDATA[{离子刻蚀机的验操作及处理模式 Inspection operation and treatment mode of plasma etcher]]><![CDATA[{离子综合性技术有哪些Q?What are the comprehensive plasma technologies?]]><![CDATA[{离子刻蚀技? Plasma etching technology]]><![CDATA[Application of plasma cleaning machine in semiconductor etching process{离子清z机在半g刻蚀工艺中的应用]]><![CDATA[微L{离子干法去胶机影响因素QInfluencing factors of microwave plasma dry degumming machine:]]><![CDATA[控溅射各有不同工作原理和应用对象Magnetron sputtering has different working principles and application objects]]><![CDATA[选择真空退火炉需要考虑的因素 Factors to be considered in selecting vacuum annealing furnace]]><![CDATA[The third industrial transfer of semiconductors, Chinas decisive victory in the "battle of tianwangshan"半导体第三次产业转移Q中国决?“天王山之战”]]><![CDATA[Sputtering is to bombard the target surface with charged particles in vacuum溅射镀膜就是在真空中利用荷能粒子蘪击靶表面]]><![CDATA[控溅射讑֤的主要用途Main uses of magnetron sputtering equipment]]><![CDATA[微L{离子去胶机操作规程 Operation procedures of microwave plasma degummer:]]><![CDATA[真空退火炉工艺布置及高温密圈概况Process layout and high temperature sealing ring of vacuum annealing furnace]]><![CDATA[In the plasma degumming machine, what is the main gas that plays a degumming role?在等d去胶Z主要起到去胶作用的气体是什么？]]><![CDATA[控溅射U类QMagnetron sputtering type?]]><![CDATA[{离子干法去胶机反应机理QReaction mechanism of plasma dry degumming machine:]]><![CDATA[PVD沉积方式的比较Comparison of PVD deposition methods]]><![CDATA[Study on the properties of aluminum plating by electron beam evaporation and magnetron sputtering电子束蒸发与控溅射镀铝性能分析研究]]><![CDATA[Principle and solution of medium frequency magnetron sputtering coating technology中频控溅射镀膜技术的原理及问题解{]]><![CDATA[蚀L腐蚀加工蚀ȝ片的工艺程Process flow of etching mesh by etching machine]]><![CDATA[金属化学蚀L的步骤Steps of metal chemical etching machine]]><![CDATA[金属标牌腐蚀机的蚀L蚀dZlIntroduction to etching process of etching solution of metal plate etching machine]]><![CDATA[教您如何为金属蚀L调配油墨QTeach you how to mix ink for metal etching machine!]]><![CDATA[蚀L喷头的作用及l护Function and maintenance of etcher nozzle]]><![CDATA[金属化学蚀L的步骤Steps of metal chemical etching machine]]><![CDATA[Why cant the development of etching machine always show through?蚀L腐蚀技术之Z么有时显影L不透？]]><![CDATA[快速退火炉l修注意事项QPrecautions for maintenance of rapid annealing furnaceQ]]><![CDATA[Whats the difference between metal etching and manual etching?蚀L用途金属腐蚀和h工腐蚀加工的区别？]]><![CDATA[带RIE{离子刻蚀机处理模式介lThe introduction of processing mode of plasma etching machine with RIE]]><![CDATA[微L{离子去胶机工作原理及应用Working principle and application of microwave plasma degummer]]><![CDATA[金属腐蚀ZȀ光蚀L的区别The difference between metal etching machine and laser etching machine]]><![CDATA[金属化学蚀L的发展简史Brief history of the development of metal chemical etching machine]]><![CDATA[蚀L喷头的作用及l护Function and maintenance of etcher nozzle]]><![CDATA[钛合金的蚀L加工工艺Etching machining technology of titanium alloy]]><![CDATA[蚀L喷头的作用及l护Function and maintenance of etcher nozzle]]><![CDATA[Why cant sputter coating completely replace thermal evaporation coating?溅射镀膜ؓ什么不能完全取代热蒸发镀膜？]]><![CDATA[蚀L腐蚀前处理工解A detailed explanation of the pretreatment process of etching machine]]><![CDATA[Factors affecting the degreasing of alkaline solution before etching the label of etching machine蚀L蚀L牌之前媄响碱液除油的的因素]]><![CDATA[快速退火炉的维修注意事Precautions for maintenance of rapid annealing furnace]]><![CDATA[Application of plasma treatment machine in surface modification of materials{离子处理机在材料表面改性中的应用]]><![CDATA[{离子体q法去胶工艺原理及用Principle and application of plasma dry degumming machine ]]><![CDATA[不锈钢装饰蚀L术？Stainless steel decorative etching technology?]]><![CDATA[CCTV: Chinas micro and medium enterprises officially announced to master the 5nm etching machine technology!央视 : 中国中微正式宣布掌握5nm刻蚀机技?]]><![CDATA[Precautions for use and routine maintenance of c406 magnetron sputtering equipmentC406控溅射讑֤使用及日怿L意事]]><![CDATA[High density plasma etching is a key step in VLSI manufacturing高密度等d体刻蚀是当今超大规模集成电路制造过E中的关键步骤]]><![CDATA[如何操作微L{离子去胶机QHow to operate microwave plasma degummer?]]><![CDATA[型{离子去胶机在工作时的表现Performance of small plasma degummer in operation]]><![CDATA[{离子刻蚀机的~点QDisadvantages of plasma etcher?]]><![CDATA[快速退火炉l修注意事项QPrecautions for maintenance of rapid annealing furnaceQ]]><![CDATA[Study on the properties of aluminum plating by electron beam evaporation and magnetron sputtering电子束蒸发与控溅射镀铝的性能分析研究]]><![CDATA[带RIE{离子刻蚀机处理模式介lThe introduction of processing mode of plasma etching machine with RIE]]><![CDATA[Chinas etching machine has successfully killed Japan and South Korea, and its high-end manufacturing goes to the world, with the technology reaching one thousandth of the hair中国刻蚀机成功秒杀日韩Q高端制造走向世界，工艺辑֏丝万分之一]]><![CDATA[Chinas plasma etching machine has reached the advanced level in the world中国{离子体刻蚀C界先q水q]]><![CDATA[型{离子去胶机在工作时的表现Performance of small plasma degummer in operation]]><![CDATA[蚀L腐蚀加工蚀ȝ片的工艺程Process flow of etching mesh by etching machine]]><![CDATA[2018 China semiconductor material and equipment industry development conference held2018中国半导体材料及讑֤产业发展大会举行]]><![CDATA[Etching is one of the key technologies to determine the feature size刻蚀是决定特征尺寸的核心工艺技术之一]]><![CDATA[微L{离子去胶机操作规程 Operation procedures of microwave plasma degummer:]]><![CDATA[感应耦合{离子体刻蚀机结构Structure of inductively coupled plasma etcher]]><![CDATA[Reactive ion etching machine is an independent RIE reactive ion etching system反应d刻蚀机是一Ƅ立式RIE反应d刻蚀pȝ]]><![CDATA[Microwave plasma dry degumming machine operation and personnel微L{离子干法去胶机操作及配合h员防护：]]><![CDATA[What is the working principle of the plasma etcher in the solar cell制作太阳能电池中的等d刻蚀机的工作原理是怎么L]]><![CDATA[{离子刻蚀机的典型应用包括哪些QWhat are the typical applications of plasma etcher?]]><![CDATA[什么公怼用到{离子刻蚀机What company will use plasma etching machine]]><![CDATA[Measurement and control of plasma etching in plasma etcher{离子刻蚀机的{离子刻蚀的测量与控制]]><![CDATA[What is intermediate frequency magnetron sputtering?]]><![CDATA[赛森电子U技是做什么的QWhat does saisen electronic technology do?]]><![CDATA[刻蚀的具体过E可描述几个步骤QHow many steps can be described in the etching process?]]><![CDATA[{离子刻蚀机通常有几UŞ式？How many kinds of plasma etchers are there?]]><![CDATA[Technical characteristics of rie-pe etcher and some data analysisRIE-PE刻蚀机技术性的特点以及一些资料分析]]><![CDATA[全自动磁控溅系l技术分cTechnical classification of fully automatic magnetron sputtering system]]><![CDATA[Is plasma etching (dry etching) and plasma cleaning one thing{离子蚀LQ干刻）与等d清洗机是一件事吗]]><![CDATA[刻蚀的具体过E可描述为如下六个步骤The specific etching process can be described as the following six steps]]><![CDATA[{离子刻蚀机的应用Application of plasma etcher]]><![CDATA[反应d刻蚀机检验操作及判断Inspection operation and judgment of reactive ion etching machine]]><![CDATA[如何操作微L{离子去胶机QHow to operate microwave plasma degummer?]]><![CDATA[什么是全自动型控溅射?What is a fully automatic magnetron sputtering table?]]><![CDATA[Classification of different processes in semiconductor manufacturing在半g刉业中，各种不同的工艺的分类]]><![CDATA[{离子去胶机主要用于哪些斚wQWhat are the main uses of plasma degumming machine?]]><![CDATA[On semiconductor equipment (1) -- source and status of domestic semiconductor equipment论半g讑֤Q一Q?--国内半导体设备来源及状况]]><![CDATA[蚀L产业的全新时代A new era of etcher industry]]><![CDATA[如何提高控溅射台的溅射效率QHow to improve sputtering efficiency of magnetron sputtering table?]]><![CDATA[The sputtering process involves complex scattering process and multiple energy transfer processes溅射q程中涉及到复杂的散过E和多种能量传递过E]]><![CDATA[{离子刻蚀工艺--装片Plasma etching process -- chip loading]]><![CDATA[How to improve the utilization rate is the key point of vacuum magnetron sputtering coating industry如何提高利用率是真空控溅射镀膜行业的重点]]><![CDATA[ The application of plasma etcher in PCB industry{离子刻蚀机在PCBU\板行业去胶渣制程的应用]]><![CDATA[赛森电子带您了解高真I磁控溅台Cycas electronics show you the high vacuum magnetron sputtering table]]><![CDATA[什么公怼用到{离子刻蚀机？What companies use plasma etchers?]]><![CDATA[{离子技术在汽R工业的用Application of plasma technology in automobile industry]]><![CDATA[控溅射台设备用途和功能特点Application and function of magnetron sputtering equipment]]><![CDATA[你知道等d去胶机的原理QDo you know the principle of plasma degummer?]]><![CDATA[{离子表面处理设备是怎样使用的？How is plasma surface treatment equipment used?]]><![CDATA[赛森电子U技告诉你磁控溅的U类Cycas electronic technology tells you the type of magnetron sputtering]]><![CDATA[湿法刻蚀相对于等d刻蚀的缺点Disadvantages of wet etching compared with plasma etching]]><![CDATA[半导体设备硅刻蚀机概qOverview of silicon etcher for semiconductor equipment]]><![CDATA[Chinas plasma etching machine has reached the advanced level in the world中国{离子体刻蚀C界先q水q]]><![CDATA[控溅射的工作原理是什么？What is the working principle of magnetron sputtering?]]><![CDATA[{离子刻蚀机的工作原理和注意事Working principle and precautions of plasma etcher]]><![CDATA[q法去胶工艺原理及用？Principle and application of dry degumming process?]]>国产日韩在线视看第一页